Search results for: handbook-of-advanced-plasma-processing-techniques

Handbook of Advanced Plasma Processing Techniques

Author : R.J. Shul
File Size : 71.50 MB
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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Handbook of Plasma Processing Technology

Author : Stephen M. Rossnagel
File Size : 81.39 MB
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This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

III V Integrated Circuit Fabrication Technology

Author : Shiban Tiku
File Size : 28.59 MB
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GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III–V processing, with emphasis on HBTs. It is aimed at practicing engineers and graduate students and engineers new to the field of III–V semiconductor IC processing. The book’s primary purpose is to discuss all aspects of processing of active and passive devices, from crystal growth to backside processing, including lithography, etching, and film deposition.

Encyclopedia of Plasma Technology Two Volume Set

Author : J. Leon Shohet
File Size : 89.49 MB
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Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

Handbook of Advanced Semiconductor Technology and Computer Systems

Author : Guy Rabbat
File Size : 78.70 MB
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Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented.

Gallium Oxide

Author : Stephen Pearton
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Gallium Oxide: Technology, Devices and Applications discusses the wide bandgap semiconductor and its promising applications in power electronics, solar blind UV detectors, and in extreme environment electronics. It also covers the fundamental science of gallium oxide, providing an in-depth look at the most relevant properties of this materials system. High quality bulk Ga2O3 is now commercially available from several sources and n-type epi structures are also coming onto the market. As researchers are focused on creating new complex structures, the book addresses the latest processing and synthesis methods. Chapters are designed to give readers a complete picture of the Ga2O3 field and the area of devices based on Ga2O3, from their theoretical simulation, to fabrication and application. Provides an overview of the advantages of the gallium oxide materials system, the advances in in bulk and epitaxial crystal growth, device design and processing Reviews the most relevant applications, including photodetectors, FETs, FINFETs, MOSFETs, sensors, catalytic applications, and more Addresses materials properties, including structural, mechanical, electrical, optical, surface and contact

Microoptics and Nanooptics Fabrication

Author : Shanalyn Kemme
File Size : 47.45 MB
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The deep interconnection between micro/nanooptical components and related fabrication technologies—and the constant changes in this ever-evolving field—means that successful design depends on the engineer’s ability to accommodate cutting-edge theoretical developments in fabrication techniques and experimental realization. Documenting the state of the art in fabrication processes, Microoptics and Nanooptics Fabrication provides an up-to-date synopsis of recent breakthroughs in micro- and nanooptics that improve key developmental processes. This text elucidates the precise and miniaturized scale of today’s fabrication methods and their importance in creating new optical components to access the spectrum of physical optics. It details successful fabrication techniques and their direct effect on the intended performance of micro- and nanooptical components. The contributors explore the constraints related to material selection, component lateral extent, minimum feature size, and other issues that cause fabrication techniques to lag behind corresponding theory in the development process. Written with the professional optical engineer in mind, this book omits the already well-published broader processing fundamentals. Instead it focuses on key tricks of the trade helpful in reformulating processes to achieve necessary optical targets, improve process fidelity, and reduce production costs. The contributing authors represent the vanguard in micro-optical fabrication. The result of their combined efforts, this searing analysis of emerging fabrication technologies will continue to fuel the expansion of optics components, from the microwave to the infrared through the visible regime.


Author : M. Edward Motamedi
File Size : 83.63 MB
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This book introduces the exciting and fast-moving field of MOEMS to graduate students, scientists, and engineers by providing a foundation of both micro-optics and MEMS that will enable them to conduct future research in the field. Born from the relatively new fields of MEMS and micro-optics, MOEMS are proving to be an attractive and low-cost solution to a range of device problems requiring high optical functionality and high optical performance. MOEMS solutions include optical devices for telecommunication, sensing, and mobile systems such as v-grooves, gratings, shutters, scanners, filters, micromirrors, switches, alignment aids, lens arrays, and hermetic wafer-scale optical packaging. An international team of leading researchers contributed to this book, and it presents examples and problems employing cutting-edge MOEM devices. It will inspire researchers to further advance the design, fabrication, and analysis of MOEM systems.

Micro Electro Mechanical System Design

Author : James J. Allen
File Size : 81.86 MB
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It is challenging at best to find a resource that provides the breadth of information necessary to develop a successful micro electro mechanical system (MEMS) design. Micro Electro Mechanical System Design is that resource. It is a comprehensive, single-source guide that explains the design process by illustrating the full range of issues involved,


Author : Abbass A. Hashim
File Size : 80.35 MB
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Understanding and building up the foundation of nanowire concept is a high requirement and a bridge to new technologies. Any attempt in such direction is considered as one step forward in the challenge of advanced nanotechnology. In the last few years, InTech scientific publisher has been taking the initiative of helping worldwide scientists to share and improve the methods and the nanowire technology. This book is one of InTechs attempts to contribute to the promotion of this technology.

Fabrication of GaAs Devices

Author : Albert G. Baca
File Size : 32.34 MB
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This book provides fundamental and practical information on all aspects of GaAs processing and gives pragmatic advice on cleaning and passivation, wet and dry etching and photolithography. Other topics covered include device performance for HBTs (Heterojunction Bipolar Transistors) and FETs (Field Effect Transistors), how these relate to processing choices, and special processing issues such as wet oxidation, which are especially important in optoelectronic devices. This book is suitable for both new and practising engineers.

Semiconductor Manufacturing Handbook

Author : Hwaiyu Geng
File Size : 43.2 MB
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This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines.

Handbook of Advanced Radioactive Waste Conditioning Technologies

Author : Michael I Ojovan
File Size : 33.5 MB
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Radioactive wastes are generated from a wide range of sources, including the power industry, and medical and scientific research institutions, presenting a range of challenges in dealing with a diverse set of radionuclides of varying concentrations. Conditioning technologies are essential for the encapsulation and immobilisation of these radioactive wastes, forming the initial engineered barrier required for their transportation, storage and disposal. The need to ensure the long term performance of radioactive waste forms is a key driver of the development of advanced conditioning technologies. The Handbook of advanced radioactive waste conditioning technologies provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes. The book opens with an introductory chapter on radioactive waste characterisation and selection of conditioning technologies. Part one reviews the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction, incineration and plasma treatment, as well as encapsulation methods such as cementation, calcination and vitrification. This coverage is extended in part two, with in-depth reviews of the development of advanced materials for radioactive waste conditioning, including geopolymers, glass and ceramic matrices for nuclear waste immobilisation, and waste packages and containers for disposal. Finally, part three reviews the long-term performance assessment and knowledge management techniques applicable to both spent nuclear fuels and solid radioactive waste forms. With its distinguished international team of contributors, the Handbook of advanced radioactive waste conditioning technologies is a standard reference for all radioactive waste management professionals, radiochemists, academics and researchers involved in the development of the nuclear fuel cycle. Provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes Explores radioactive waste characterisation and selection of conditioning technologies including the development of advanced materials for radioactive waste conditioning Assesses the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction

Advanced Topics in Materials Science and Engineering

Author : J.L. Morán-López
File Size : 35.11 MB
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This volume contains the papers presented at the First Mexico-U.S.A. Symposium on Materials Sciences and Engineering held in Ixtapa, Guerrero, Mexico, during Septem ber 24-27, 1991. The conference was conceived with the primary objective of increas ing the close ties between scientists and engineers in both Mexico and the U.S. with an interest in materials. The conference itself would have not taken place without the drive, determination and technical knowledge of John K. Tien of the University of Texas at Austin and of Francisco Mejia Lira of the Universidad de San Luis Potosi. This book is dedicated to their memory. The event brought together materials scientists and engineers with interests in a broad range of subjects in the processing, characterization and properties of advanced materials. Several papers were dedicated to structural materials ranging from ferrous alloys to intemetallics, ceramics and composites. The presentation covered properties, processing, and factors that control their use, such as fatigue and corrosion. Other materials and properties were also explored by U.S. and Mexican participants. Sev eral papers dealt with the characterization and properties of magnetics, optical and superconductor materials, nanostructured materials, as well as with computational and theoretical aspects likely to impact future materials research and development.

Micromachining Technology for Micro optics and Nano optics V and Microfabrication Process Technology XII

Author : Mary Ann Perez-Maher
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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Handbook of Modern Coating Technologies

Author : Mahmood Aliofkhazraei
File Size : 38.67 MB
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Handbook of Modern Coating Technologies: Fabrication Methods and Functional Properties reviews different fabrication methods and functional properties of modern coating technologies. The topics in this volume consist of nanocoatings by sol–gel processes for functionalization of polymer surfaces and textiles and mechanical fabrication methods of nanostructured surfaces such surface mechanical attrition treatment, polymer nanofabrications and its plasma processing, chemical vapor deposition of oxide materials at atmospheric pressure, conventional chemical vapor deposition process at atmospheric pressure, feasibility of atmospheric pressure, chemical vapor deposition process, Langmuir–Blodgett technique, flame pyrolysis, confined-plume chemical deposition, electrophoretic deposition, in vitro and in vivo particle coating for oral targeting and drug delivery, novel coatings to improve the performance of multilayer biopolymeric films for food packaging, corrosion protection by nanostructured coatings, tribological behavior of electroless coatings, effect of peening-based processes on tribological and mechanical behavior of bioimplant materials, improved efficiency of ceramic cutting tools in machining hardened steel with nanostructured multilayered coatings, incorporation of elastomeric secondary phase into epoxy matrix influences mechanical properties of epoxy coatings, enhancement of biocompatibility by coatings, porous hydroxyapatite–based coatings, and bionic colloidal crystal coatings.

Advanced Plasma Spray Applications

Author : Hamidreza Salimi Jazi
File Size : 48.46 MB
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Recently, plasma spray has been received a large number of attentions for various type of applications due to the nature of the plasma plume and deposition structure. The plasma gas generated by the arc, consists of free electrons, ionized atoms, some neutral atoms, and undissociated diatomic molecules. The temperature of the core of the plasma jet may exceed up to 30,000 K. Gas velocity in the plasma spray torch can be varied from subsonic to supersonic using converging-diverging nozzles. Heat transfer in the plasma jet is primarily the result of the recombination of the ions and re-association of atoms in diatomic gases on the powder surfaces and absorption of radiation. Taking advantages of the plasma plume atmosphere, plasma spray can be used for surface modification and treatment, especially for activation of polymer surfaces. I addition, plasma spray can be used to deposit nanostructures as well as advanced coating structures for new applications in wear and corrosion resistance. Some state-of-the-art studies of advanced applications of plasma spraying such as nanostructure coatings, surface modifications, biomaterial deposition, and anti wear and corrosion coatings are presented in this book.

Micromachining and Microfabrication Process Technology

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Device and Process Technologies for MEMS and Microelectronics

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Handbook of Advanced Industrial and Hazardous Wastes Management

Author : Lawrence K. Wang
File Size : 74.70 MB
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This volume provides in-depth coverage of environmental pollution sources, waste characteristics, control technologies, management strategies, facility innovations, process alternatives, costs, case histories, effluent standards, and future trends in waste treatment processes. It delineates methodologies, technologies, and the regional and global effects of important pollution control practices. It focuses on specific industrial and manufacturing wastes and their remediation. Topics include: heavy metals, electronics, chemical, and textile manufacturing.